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Products >  Substrates for thin film applications > TiO2(Rutile)Substrate
Substrates for thin film applications
TiO2(Rutile)Substrate
 
 

We supply rutile substrates which are suitable for the epitaxial growth.
Varieties of substrate are not only normal type but also conductive type and step-surface type. We hope that will help your research and development.

 
   High quality material.
 We can supply Nb doped crystal (conductive substrates).
 We offer STEP substrate with ultra-precise surface.
 
 
Crystal system Tetragonal
Space group P42/mnm
Lattice constant a = 0.459 nm
c = 0.295 nm
Melting point
1840  
Density
4.252 g/cm3 (20 )
Dielectric constant
113 (1 KHz)
Thermal expansion
(30~400)
(// a-axis) 7.81 10-6 /
(// c-axis) 10.1 10-6 /
Band gap
3.0 eV  
Refractive index
(at 706.5 nm)
no=2.5490
ne=2.8226
 
 
  Standard substrate list
 
 
Doping Size(mm) Polish Surface treatment Orientation
(100) (110) (001)
Non 10x10x0.5 One side Normal
Both side Normal
One side STEP
15x15x0.5 One side Normal
Both side Normal
One side STEP
Nb:0.05wt% 10x10x0.5 One side Normal
Both side Normal
One side STEP
15x15x0.5 One side Normal
Both side Normal
One side STEP
Nb:0.5wt% 10x10x0.5 One side Normal
Both side Normal
One side STEP
15x15x0.5 One side Normal
Both side Normal
One side STEP
 
  : standard : order product
*) Please ask the specification, different size, off-set angle substrate, doped substrate, etc.
*) We accept orders from 5p.
Please send any questions or requests for sales@shinkosha.com .
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