Rutile is attracting attention not only as a birefringent material for optics but also as a substrate for epitaxial growth.
Our TiO2 crystal has world-leading size, quality, and production volume, and it is made by integrated production system starting from Verneuil crystal growth to the surface polishing.
Nb:TiO2 substrate with electrical conductivity and STEP substrates with atomically flat surface are also available. We hope our substrates can help your research.
| Composition | TiO2 |
|---|---|
| Crystal system | Tetragonal |
| Crystal structure | Rutile |
| Lattice constant | a=0.45935 nm, c=0.29580 nm |
| Melting point | 1840 ℃ |
| Growth method | Verneuil method |
| Density | 4.252 g/cm3(20 ℃) |
| Dielectric constant | 113 (1 MHz) |
| Thermal expansion coefficient (30～400℃） | (a-axis）7.81×10-6/℃ , (c-axis）10.1×10-6/℃ |
| Band gap | 3.0 eV |
| Refractive index (at 706.5 nm) | no=2.5490, ne=2.8226 |
X-ray rocking curve of rutile crystal
Transmittance of Rutile (TiO2)
| Type | TiO2 | Nb(0.05 wt%) :TiO2 Nb=0.04 at% | Nb(0.5 wt%) :TiO2 Nb=0.43 at% |
|---|---|---|---|
| Purity | >99.98 % | >99.98 % | >99.98 % |
| Resistivity (Ω・cm) | >107 | Approx. 5×100 | Approx. 3×10-1 |
| Orientation （Tolerance：±0.5 °) | (100) (110) (001) | (100) (110) (001) | (100) (110) (001) |
|
Size (Outer size tolerance: ±0.1 mm / Thickness tolerance: ±0.05 mm) |
10×10×0.5t 15×15×0.5t |
10×10×0.5t 15×15×0.5t |
10×10×0.5t 15×15×0.5t |
| Polishing | One-side / Both-side | One-side / Both-side | One-side / Both-side |
| Surface roughness |
Ra≦1.0nm Rmax≦5.0nm |
Ra≦1.0nm Rmax≦5.0nm |
Ra≦1.0nm Rmax≦5.0nm |
|
Flatness (λ=632.8 nm) |
10×10≦λ 15×15≦1.5λ |
10×10≦λ 15×15≦1.5λ |
10×10≦λ 15×15≦1.5λ |
| Options | STEP substrate OFF substrate Breakable substrate |
STEP substrate OFF substrate Breakable substrate |
STEP substrate OFF substrate Breakable substrate |
※If you are looking for other specs, please contact us.
