Oxide single crystal substrates for thin-film growth
Oxide single crystal substrates for thin-film growth

Since the 1980s, we have been contributing to the advancement of science and technology by providing SrTiO3 and sapphire substrates for high-temperature superconducting thin-film and GaN.

Crystallinity, flatness, surface roughness, and the presence or absence of the lattice strain in the top surface are important in substrate for epitaxial growth. Our company has accumulated many years of technology, and it enables a high quality surface without affected layer and integrated production – from crystal growth (except for some crystals) to the surface polishing. Standard substrates are in stock and can be delivered in about a week after your order. It is also possible to customize the surface orientation, dimensions, and OFF angle to suit your needs. We also handle crystalline materials that are not in our lineup, so please feel free to contact us. We provide oxide crystal substrates suitable for epitaxial growth of dielectrics, superconductors and compound semiconductors.